Abstract
The Effect of Thermal Annealing on the Optical Properties of a-SiC:H Films Produced by DC Sputtering Methods: I. Graphite Target Case. A study of the annealing effect on optical properties and disorder of hydrogenated amorphous silicon carbon (a-SiC:H) films was undertaken. The films were prepared by sputtering technique using graphite target and silicon wafer in argon and hydrogen gas mixture, and then characterized by uv-vis (ultra violet-visible) spectroscopy before and after annealing. Index of refraction n and absorption coefficient α of films have been determined from measurements of transmittance. The optical gap show small variation with annealing temperature, increasing with increasing annealing temperature up to 500 °C. An increase of annealing temperature leads to reduced film density and the amorphous network disorder. The experimental results are discussed in terms of deposition condition and compared to other experimental results.
References
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Recommended Citation
Saleh, Rosari; Munisa, Lusitra; and Marianty, Dewi
(2003)
"PENGARUH ANIL TERMAL TERHADAP BESARAN OPTIS LAPISAN TIPIS a-SiC:H HASIL METODE DC SPUTTERING II. TARGET GRAFIT,"
Makara Journal of Science: Vol. 7:
Iss.
1, Article 7.
Available at:
https://scholarhub.ui.ac.id/science/vol7/iss1/7
