Abstract
The substitution of Ti atoms by Al atoms in TiN lattice sites to form (Ti1-xAlx)N is clearly demonstrated by the coatings which were deposited on steel substrate and using plasma CVD technique. The presence of Al atoms in TiN lattice site is shown by means of XRD and EDX techniques: lattice parameters decreasing of TiN as the fraction of Al increases (XRD) and precipitation of hexagonal AlN phase (XRD) as the fraction of Al exceeding 0.8 (EDX). The hardness of these coating are just around 30 GPa, which is beyond the values reported in literatures.
Bahasa Abstract
Substitusi Atom Ti dengan Al dalam kristal TiN untuk membentuk paduan (Ti1-xAlx)N sangat jelas diperagakan dari lapisan tipis yang dideposisi di atas substrat stainless steel dengan menggunakan teknik plasma CVD. Adanya atom Al dalam kristal TiN ditunjukkan dengan XRD dan EDX: penurunan konstanta kisi TiN sesuai dengan kenaikan fraksi Al (XRD) dan presipitasi fase hexagonal AlN (XRD) ketika fraksi Al melewati 0,8 (EDX). Kekerasan lapisan tipis ini hanya sekitar 30 GPa, yang melebihi hasil-hasil yang ada dalam literatur.
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Recommended Citation
Moto, Keba
(2002)
"Making Alloys (TI1 - xAlx) N using plasma CVD technique from AlCl3 Powder, H2 and N2 Gas ,with solvent TiCl4,"
Makara Journal of Technology: Vol. 6:
Iss.
1, Article 5.
DOI: 10.7454/mst.v6i1.6
Available at:
https://scholarhub.ui.ac.id/mjt/vol6/iss1/5
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Chemical Engineering Commons, Civil Engineering Commons, Computer Engineering Commons, Electrical and Electronics Commons, Metallurgy Commons, Ocean Engineering Commons, Structural Engineering Commons
