Structural and Photoluminescence Properties of ZnO Thin Films Deposited by Ultrasonic Spray Pyrolysis

Authors

Iwan Sugihartono, Physics Study Program, Faculty of Mathematics and Natural Sciences, Universitas Negeri Jakarta, Rawamangun 13220, IndonesiaFollow
Erfan Handoko, Physics Study Program, Faculty of Mathematics and Natural Sciences, Universitas Negeri Jakarta, Rawamangun 13220, Indonesia
Vivi Fauzia, Department of Physics, Faculty of Mathematics and Natural Sciences, Universitas Indonesia, Depok 16424, Indonesia
Artoto Arkundato, Department of Physics, Faculty of Mathematics and Natural Sciences, Universitas Jember, Jember 68121, Indonesia
Lara Permata Sari, Physics Study Program, Faculty of Mathematics and Natural Sciences, Universitas Negeri Jakarta, Rawamangun 13220, Indonesia

Abstract

Zinc oxide (ZnO) thin films on a silicon (Si) (111) substrate were grown herein using ultrasonic spray pyrolysis at 450 °C with different Zn concentrations. The ZnO thin films had X-ray diffraction patterns of a polycrystalline hexagonal wurtzite structure. The (002) and (101) peak intensities changed under different Zn concentrations. Furthermore, according to Scherer's and Stokes–Wilson equations, the crystallite size and the internal strain of the ZnO thin films in the (002) and (101) peaks changed with the Zn concentration. Optically, the photoluminescence spectra indicated that the ratio of the UV/GB emission of the ZnO thin films was the highest at the Zn concentration of 0.02 mol/mL. We predicted that by increasing the Zn concentrations, the nonradiative transitions, which originated from defects, such as lattice and surface defect, become dominant. In conclusion, the ZnO thin films with the Zn concentration of 0.02 mol/mL had a better crystalline and optical quality.

Bahasa Abstract

Karakteristik Struktur dan Fotoluminisen dari Lapisan Tipis ZnO yang Dideposisikan menggunakan Pengkabutan Ultrasonik. Lapisan tipis seng oksida (ZnO) telah ditumbuhkan di atas substrat silikon (111) menggunakan pengkabutan ultrasonik dengan variasi konsentrasi Zn pada suhu 450 °C. Berdasarkan pengujian difraksi sinar-X, lapisan tipis ZnO memiliki struktur wurtzite berbentuk hexagonal polikristalin. Dua buah puncak yang memiliki orientasi bidang (002) dan (101) memiliki perubahan intensitas akibat adanya variasi konsentrasi Zn. Begitupula hasil perhitungan yang mengacu pada persamaan Scherer’s dan Stokes-Wilson, memberikan informasi bahwa ukuran kristallite dipengaruhi oleh konsentrasi Zn. Secara optik, perbandingan emisi UV/GB yang teramati dari spektrum fotoluminisen memiliki nilai tertinggi ketika konsentrasi Zn 0.02 mol/mL. Kami memprediksikan bahwa penambahan konsentrasi Zn, transisi non-radiative yang berasal dari defek-defek (defek kisi dan permukaan) menjadi dominan. Sebagai kesimpulan, lapisan tipis ZnO yang memiliki konsentrasi Zn 0.02 mol/mL memiliki kualitas kristal dan optik yang lebih optimal.

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Recommended Citation

Sugihartono, Iwan; Handoko, Erfan; Fauzia, Vivi; Arkundato, Artoto; and Sari, Lara Permata (2018) "Structural and Photoluminescence Properties of ZnO Thin Films Deposited by Ultrasonic Spray Pyrolysis," Makara Journal of Technology: Vol. 22: Iss. 1, Article 3.
DOI: 10.7454/mst.v22i1.3423
Available at: https://scholarhub.ui.ac.id/mjt/vol22/iss1/3